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etching

英 [ˈetʃɪŋ]

美 [ˈetʃɪŋ]

n.  蚀刻画; 蚀刻术; 蚀刻法
v.  蚀刻,凿出(玻璃、金属等上的文字或图画); (脸上)流露出; 铭刻; 画出…的轮廓
etch的现在分词

复数:etchings 现在分词:etching 

GRE化学

BNC.16752 / COCA.14836

牛津词典

    noun

    • 蚀刻画;蚀刻术;蚀刻法
      a picture that is printed from an etched piece of metal; the art of making these pictures

      柯林斯词典

      • 蚀刻版画
        Anetchingis a picture printed from a metal plate that has had a design cut into it with acid.

        英英释义

        noun

        • making engraved or etched plates and printing designs from them
            Synonym:engraving
          1. an etched plate made with the use of acid
            1. an impression made from an etched plate

              双语例句

              • This technique takes advantage of the large difference in etching properties for different crystallographic planes in alkaline solution.
                这项技术利用了硅的不同晶面在碱性腐蚀溶液中具有不同腐蚀速率的特性。
              • The paper describes that the principLe and advantage of Digital inkjet printing for etching circuits of PCB.
                文章概述了用于PCB蚀刻线路中数字喷墨打印技术的原理和优点。
              • No resolved etching was developed.
                并无可溶性侵蚀发生。
              • An etching made by this process. There is corrode spot and pitting on the surface of all valve.
                细点腐蚀制板法的过程所有阀门表面上都有腐蚀斑痕和麻点。
              • The combination of refractory and noble metals in a single layer makes etching a formidable task.
                难熔金属和贵金属组合的这一层薄膜使刻蚀成为一个艰巨任务。
              • HF vapor-phase etching was studied under different temperatures and different conditions for fabrication of suspended nano structure.
                针对纳米悬浮结构的制作,对不同温度和不同气相条件下的氢氟酸(HF)气相刻蚀进行了研究。
              • Besides, the anti-dry etching property is improved.
                同时,也改善了抗干刻蚀的性能。
              • Therefore, plasma etching anisotropy can be improved by increasing rf frequency or rf-bias power.
                因此,等离子体刻蚀的各向异性可以通过增加射频频率和射频功率来改善。
              • Circulating device is needed in electrochemical etching course.
                在电化学刻蚀过程中,需增加循环装置。
              • The designed SOI nanowire AWGs were fabricated using ultraviolet lithography and induced coupler plasma etching.
                通过深紫外光刻和感应耦合等离子刻蚀设备,制备了所设计的器件。